Temperature Characteristics of Nano-Dimensional FinFET with P Type GaP Semiconductor Channel Based on ION/IOFF and Subthreshold Swing (SS)

Authors

  • Yasir Hashim Tishk International University
  • Safwan Mawlood Hussein Computer Engineering Department, Tishk International University

DOI:

https://doi.org/10.53799/ajse.v23i3.1002

Keywords:

FinFET, MOSFET, temperature, nano, transistor.

Abstract

This study discusses the effects of working temperature on the GaP-FinFET structure. Using the Multi-Gate Field Effect Transistors (MuGFET) simulation tool, the properties of FinFET have been generated over a temperature range of T=0 °C to T=125 °C. First, the structure of P-channel GaP-FinFET with such temperature vary and constant channel Fin parameters are simulated to find their current-voltage characteristics. The higher ΔI at the applied voltage inside the -0.7 to -1 V gate voltage range of the P-channel GaP-FinFET work as a temperature sensor in nano dimensions. The highest ∆I and sensitivity of temperature for P-channel GaP-FinFETs happen at Vg=-1 V, although the SS and ION/IOFF deteriorate as the working temperature rises.

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Published

2024-12-31

How to Cite

[1]
“Temperature Characteristics of Nano-Dimensional FinFET with P Type GaP Semiconductor Channel Based on ION/IOFF and Subthreshold Swing (SS)”, AJSE, vol. 23, no. 3, pp. 209–213, Dec. 2024, doi: 10.53799/ajse.v23i3.1002.

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